ELF-MF exposure of workers were classified based on the quartiles of ELF-MF distribution. All measurements were categorized by operation, job and working activity during working time. A portable device was used to monitor ELF-MF in high temporal resolution. These were demonstrated by assessing the exposure of 117 workers involved in wafer fabrication (fab) and chip packaging wearing personal dosimeters for a full shift. We assessed the exposure of semiconductor workers to extremely low frequency-magnetic fields (ELF-MF) and identified job characteristics affecting ELF-MF exposure.
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